CMOS nanoelectronics : innovative devices, architectures, and applications /
<STRONG>General Introduction Part 1: Integration of Multigate Devices (FinFET) </STRONG>Introduction to Multigate Devices and Integration Challenges Patterning Requirements for Multigate Devices Gate Stack Design Source/Drain Design: Reduction of Parasitic Resistance <STRONG>Part 2...
Saved in:
| Online Access: |
Full text (MCPHS users only) |
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| Other Authors: | |
| Format: | Electronic eBook |
| Language: | English |
| Published: |
Boca Raton, Fla. :
Pan Standford Pub.,
2012
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| Subjects: | |
| Local Note: | ProQuest Ebook Central |
| Summary: | <STRONG>General Introduction Part 1: Integration of Multigate Devices (FinFET) </STRONG>Introduction to Multigate Devices and Integration Challenges Patterning Requirements for Multigate Devices Gate Stack Design Source/Drain Design: Reduction of Parasitic Resistance <STRONG>Part 2: Circuit-Related Aspects </STRONG>Variability and Its Implications for FinFET SRAM High T Performance of FinFET ESD and Multigate Devices <STRONG>Part 3: Beyond FinFET </STRONG>The Junctionless Nanowire Transistor Transport in Nanostructures Transport Spectr. |
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| Physical Description: | 1 online resource (xviii, 412 pages) : color illustrations |
| Bibliography: | Includes bibliographical references. |
| ISBN: | 9789814364034 9814364037 |
