CMOS nanoelectronics : innovative devices, architectures, and applications /
<STRONG>General Introduction Part 1: Integration of Multigate Devices (FinFET) </STRONG>Introduction to Multigate Devices and Integration Challenges Patterning Requirements for Multigate Devices Gate Stack Design Source/Drain Design: Reduction of Parasitic Resistance <STRONG>Part 2...
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| Online Access: |
Full text (MCPHS users only) |
|---|---|
| Other Authors: | |
| Format: | Electronic eBook |
| Language: | English |
| Published: |
Boca Raton, Fla. :
Pan Standford Pub.,
2012
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| Subjects: | |
| Local Note: | ProQuest Ebook Central |
Table of Contents:
- 1. Integration of multi-gate devices (FinFET)
- 2. Circuit-related aspects
- 3. Exploratory devices and characterization tools.
