Ion Implantation and Activation - Volume 3.
Ion Implantation and Activation presents the derivation process of related models in a comprehensive step by step manner starting from the fundamental processes and moving up into the more advanced theories. Chapters in the book explain, in depth, various topics such as Pearson functions, LSS theory...
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Full text (MCPHS users only) |
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Main Author: | |
Format: | Electronic eBook |
Language: | English |
Published: |
Sharjah :
Bentham Science Publishers,
2013
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Series: | Ion Implantation and Activation.
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Subjects: | |
Local Note: | ProQuest Ebook Central |
MARC
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100 | 1 | |a Suzuki, Kunihiro. | |
245 | 1 | 0 | |a Ion Implantation and Activation - Volume 3. |
260 | |a Sharjah : |b Bentham Science Publishers, |c 2013. | ||
300 | |a 1 online resource (212 pages) | ||
336 | |a text |b txt |2 rdacontent | ||
337 | |a computer |b c |2 rdamedia | ||
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490 | 1 | |a Ion Implantation and Activation | |
504 | |a Includes bibliographical references and index. | ||
505 | 0 | |a Cover; Title; EUL; Contents; Preface; Acknowledgement; Chapter 01; Chapter 02; Chapter 03; Chapter 04; Chapter 05; Chapter 06; Chapter 07; Index. | |
520 | |a Ion Implantation and Activation presents the derivation process of related models in a comprehensive step by step manner starting from the fundamental processes and moving up into the more advanced theories. Chapters in the book explain, in depth, various topics such as Pearson functions, LSS theory, Monte Carlo simulations, Edgeworth Polynomials and much more. This book provides advanced engineering and physics students and researchers with complete and coherent coverage of modern semiconductor process modeling. | ||
546 | |a English. | ||
588 | 0 | |a Print version record. | |
590 | |a ProQuest Ebook Central |b Ebook Central Academic Complete | ||
650 | 0 | |a Ion implantation. | |
650 | 0 | |a Ion accelerators. | |
758 | |i has work: |a Ion Implantation and Activation - Volume 3 (Text) |1 https://id.oclc.org/worldcat/entity/E39PD3bKTHVfbqMft4JpTwKBw3 |4 https://id.oclc.org/worldcat/ontology/hasWork | ||
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830 | 0 | |a Ion Implantation and Activation. | |
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